Charged particle source module

ABSTRACT

The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

BACKGROUND

The disclosed embodiments relate to a charged particle source module forgenerating and emitting a charged particle beam. The disclosedembodiments further relate to an exposure system with said chargedparticle source module, a charged particle source arrangement, a methodfor manufacturing a semiconductor device and a method for inspecting atarget.

Charged particles sources are arranged for generating and emitting abeam of charged particles, which beam of charged particles may bedirected towards a surface or a target. A known charged particle sourcecomprises a source cathode and multiple electrodes located downstream ofsaid source cathode.

A charged particle source is known from WO 2015/101538 A1 of theApplicant, where the source is applied in a lithographic exposuresystem. The charged particle source comprises a cathode arrangementcomprising; a thermionic cathode comprising an emission portion providedwith an emission surface for emitting electrons, and a reservoir forholding a material, wherein the material, when heated, releases workfunction lowering particles that diffuse towards the emission portionand emanate at the emission surface at a first evaporation rate; afocusing electrode comprising a focusing surface for focusing theelectrons emitted from the emission surface of the cathode; and a heatsource configured for heating the material held in the reservoir.

Another charged particle source is known from Proc. of SPIE, Vol. 8680,868000-1 to -12, see FIGS. 6, 7 and 8 .

The known charged particle sources are, apart from use in chargedparticle exposure systems, such as charged particle lithography systems,also applied in charged particle inspection systems or microscopes. Atleast in these applications, the individual components of the chargedparticle source must be accurately aligned with respect to each other.In addition, connecting the individual components of the chargedparticle source to corresponding power supply arrangements is cumbersomeand must be performed with care not to disturb the alignment of theindividual components of the charged particle source with respect toeach other.

It is an object of the disclosed embodiments to ameliorate or toeliminate one or more disadvantages of the prior art, or to at leastprovide an alternative charged particle source.

SUMMARY

According to a first aspect, the disclosed embodiments provide a chargedparticle source module for generating and emitting a charged particlebeam, comprising:

a frame including a first rigid frame part, a second rigid frame part,and one or more rigid support members which are arranged between andrigidly connected to said first frame part and said second frame part;

a charged particle source arrangement for generating a charged particlebeam, wherein said charged particle source arrangement is arranged atsaid second frame part; and

a power connecting assembly arranged at said first frame part,

wherein said charged particle source arrangement is electricallyconnected to said power connecting assembly via electrical wiring.

According to the first aspect of the disclosed embodiments, said chargedparticle source arrangement is arranged at said second frame part and iselectrically connected to said power connecting assembly via electricalwiring, which power connecting assembly is arranged at said first framepart.

Since said power connecting assembly is arranged at said first framepart, a force applied to said power connecting assembly, for exampleduring connection of an external power supply to said power connectingassembly, can be led into the first frame part. The force led into thefirst frame part can be transferred from said first frame part to saidsecond frame part via the rigid support members, therewith preventingthat said force acts on said charged particle source arrangement or theindividual components thereof. Thereby, a strain relieving arrangementis provided. As a result of the strain relieving arrangement, thealignment and the relative positions of the individual components ofsaid charged particle source arrangement with respect to each other ismaintained.

The charged particle source arrangement may be arranged for generatingan electron beam. The charged particle source arrangement may comprisean emitter arrangement for emitting electrons, from which an electronbeam is formed.

Additionally, the use of said charged particle source module accordingto the disclosed embodiments may provide for a robust arrangement whichreduces or in an ideal case eliminates one or more external forcesexerted on said charged particle source arrangement for example duringtransport of said source module, during mounting of said source moduleinto an exposure system, and during connection of an external powersupply to said charged particle source module.

Furthermore, the power connecting assembly provides an appropriatesubstantially single connection terminal at which the charged particlesource module can be connected to the required power supply and controlleads for controlling the functioning of said charged particle sourcearrangement.

According to a second aspect, the disclosed embodiments provide acharged particle source module for generating and emitting a chargedparticle beam, comprising: a frame including a first frame part, asecond frame part, and one or more rigid support members which arearranged between said first frame part and said second frame part;

a charged particle source arrangement for generating a charged particlebeam, wherein said charged particle source arrangement is arranged atsaid second frame part; and

a power connecting assembly arranged at said first frame part,

wherein said charged particle source arrangement is electricallyconnected to said power connecting assembly via electrical wiring,

wherein said electrical wiring comprises one or more wires with aservice loop.

In the context of the present patent application, a service loop has tobe understood as an extra length of electrical wire, preferably providedin a bend or loop, which is included as a strain relieving measure. Suchbend may be included for example as a portion of the electrical wireextending with a bend in a direction substantially perpendicular to thedirection of the one or more electrical wires. During use, electricalpower runs through said one or more electrical wires thereby increasingthe temperature of said one or more electrical wires. The increasingtemperature of said one or more electrical wires results in thermalexpansion of said one or more electrical wires. Thermal expansion ofsaid one or more electrical wires can be absorbed by the service loop ofthe respective electrical wire. Therewith, it is prevented that a forceis applied to said charged particle source arrangement due to thermalexpansion of said one or more electrical wires.

Additionally, in case that a (small) part of a force applied to saidpower connecting assembly is transferred towards said charged particlesource arrangement via said power connecting assembly, said force isabsorbed by said service loops of said electrical wires. It is therewithprevented that a force is applied to said charged particle sourcearrangement.

In an embodiment said frame comprises mounting members which areconnected to said second frame part by flexure connections, preferablywherein said second frame part comprises a mounting plate and each ofsaid flexure connections comprises a connecting lip provided at theouter circumference of said mounting plate, wherein each connecting lipdefines a slit between said mounting plate and said connecting lip. Saidmounting members are intended to mount said charged particle sourcemodule to an exposure system or to a charged particle opticalarrangement of an exposure system. In operation, said charged particlesource arrangement generates and emits a charged particle beam which isdirected towards said second frame part. It might occur that a part ofthe charged particle beam or a number of some charged particlesimpinge(s) on said second frame part directly or indirectly, whichresults in an increased temperature of said second frame part. Due tothe increased temperature, said second frame part may deform in asubstantially radial direction with respect to the longitudinal centeraxis of said charged particle source module. Said flexure connectionswith said connecting lips as well as said slits enable the second framepart to deform in a substantially radial direction with respect to thelongitudinal center axis of said charged particle source module, whilesaid mounting members remain in position and said charged particlesource module is kept aligned to the exposure system or with the chargedparticle optical arrangement, preferably in a direction traverse to thelongitudinal axis of said charged particle source module.

Additionally, said mounting members which are connected to said secondframe part by flexure connections provide the possibility to mount saidcharged particle source module to a not perfectly flat surface. Due tothe mounting members within the flexure connections a proper abutment ofsaid charged particle source module to for example a charged particleoptical arrangement is established.

In an embodiment said first frame part, said second frame part and/orsaid one or more rigid support members are made of non-ferrous material.Non-ferrous material includes non-magnetic properties, which has to beunderstood as being not magnetic and being not magnetizable. Anadvantage of this embodiment is that the charged particles within thecharged particle beam generated by the charged particle sourcearrangement are not influenced by the frame or the components thereof.

In an embodiment said power connecting assembly is rigidly connected tosaid first frame part, and said charged particle source arrangement isrigidly connected to said second frame part. When said power connectingassembly is rigidly connected to said first frame part, it is preventedthat said first frame part and said power connecting assembly move withrespect to each other, such as rotating around and/or tilting withrespect to the longitudinal axis of said frame, when a force applied tothe power connecting assembly is led into said first frame part. Suchmovement may be detrimental to for example said charged particle sourcearrangement or said electrical wiring between said charged particlesource arrangement and said power connecting assembly. Said chargedparticle source arrangement is rigidly connected to said second framepart for substantially the same reason.

In an embodiment said power connecting assembly comprises anelectrically non-conductive connecting plate which is arranged at saidfirst frame part of said frame, wherein said power connecting assemblycomprises one or more connectors. By using a non-conductive connectingplate in combination with connectors, said power connecting assemblyenables an external power supply to be connected to said powerconnecting assembly for providing electrical energy to said chargedparticle source arrangement, while it is prevented that said electricalenergy is applied to said frame.

In an embodiment said one or more connectors extend through saidelectrically non-conductive connecting plate in a directionsubstantially parallel to said support members of said frame. As aresult of the connectors extending substantially parallel or parallel tosaid rigid support members, a force applied to said connectors duringfor example connection of an external power supply to said connectorscan be led easily towards and into said support members since theapplied force continues in substantially the same direction as in whichit is applied. The risk to any force being applied to said chargedparticle source arrangement is therefore reduced or in the ideal caseeliminated.

In an embodiment said first frame part comprises two substantiallyparallel plates, wherein the power connecting assembly is secured,preferably clamped between said two plates. A movement of said powerconnecting assembly in a direction parallel to said support memberswould exert a detrimental force to said charged particle sourcearrangement or said electrical wiring between said charged particlesource arrangement and said power connecting assembly. Such detrimentalforce distorts the charged particle source arrangement and/or theelectrical wiring thereof negatively. By clamping the power connectingassembly between two plates, it is prevented that the power connectingassembly moves along the direction substantially parallel to saidsupport members or rotates about a rotation axis extending through saidpower connecting assembly in a direction substantially perpendicular tosaid support members, when a force is exerted onto said power connectingassembly.

In an embodiment said charged particle source arrangement comprises anemitter arrangement configured for emitting charged particles, and anelectrode for forming a charged particle beam from said chargedparticles emitted by said emitter arrangement, preferably wherein saidcharged particle source arrangement comprises two or more electrodes forforming a charged particle beam from said charged particles emitted bysaid emitter arrangement, wherein a most downstream electrode of saidtwo or more electrodes is preferably arranged at said second frame partof said frame, wherein said most downstream electrode and said secondframe part are preferably formed as a single part. By using said mostdownstream electrode both to shape the charged particle beam generatedand emitted by said emitter arrangement and to secure said chargedparticle source arrangement to said second frame part of said frame, thenumber of parts of said charged particle source module may be kept to aminimum.

In an embodiment said emitter arrangement and said electrode areconnected to one or more electrically non-conductive supports orientedsubstantially parallel to an optical axis defined by said emitterarrangement and said electrode, wherein each of said one or moresupports is connected with an outer circumference of said emitterarrangement and with an outer circumference of said electrode, andwherein said one or more supports maintain the orientation and/or theposition of said emitter arrangement and said electrode with respect toeach other, preferably wherein at least one of said emitter arrangementand said electrode is connected with said one or more supports by meansof a flexure connection. Said supports are provided for maintaining theorientation and/or the position of said electrode and said emitterarrangement with respect to each other. During operation, said emitterarrangement generates and emits a charged particle beam which is shapedby means of said electrode. A part of said charged particle beam or anumber of individual charged particles from said emitter arrangement mayimpinge on said electrode, which leads to an increased temperature ofsaid electrode. An increased temperature of said electrode may lead todeformation, in particular expansion of said electrode. Since saidelectrode is connected to said supports, such deformation leads tobending and/or warping of said electrode when not provided with aflexure connection, therewith distorting an electrical field formedbetween said electrode and said emitter arrangement. Said flexureconnection enables said electrode to deform substantially in a radialdirection with respect to the longitudinal center axis of said chargedparticle source arrangement while said supports maintain the positionthereof and warping and/or bending of said electrode is prevented.Moreover, said electrode maintains the (intended) charged particleoptical function thereof.

In an embodiment a plurality of said electrodes is provided. By theflexure connection provided at each electrode the mutual orientationand/or position can be maintained. Thereby, the charged particle opticalfunction, for example a lens function, is maintained.

In an embodiment at least one of said emitter arrangement and saidelectrode is rigidly connected to said one or more supports, preferablywherein said most downstream electrode is rigidly connected to said oneor more supports. Said most downstream electrode is arranged at saidsecond frame part and, during operation, may be connected to an exposuresystem or a charged particle optical arrangement thereof. The thermalenergy introduced by the charged particles impinging on and absorbed bysaid most downstream electrode is led towards said second frame partand/or said exposure system or said charged particle optical arrangementthereof. Optionally, said charged particle optical arrangement isactively cooled. An increase of the temperature of said most downstreamelectrode due to charged particles impinging onto said most downstreamelectrode is therefore counteracted.

In an embodiment said emitter arrangement and said electrode comprise aplate-shaped electrode body, wherein said flexure connection comprises aconnecting lip provided at the outer circumference of said plate-shapedelectrode body, wherein said connecting lip defines a slit between saidconnecting lip and said plate-shaped electrode body. As explainedbefore, due to charged particles impinging onto said electrode, thetemperature of said electrode increases, which can lead to thermalexpansion of said electrode radially outwards with respect to thelongitudinal center axis of said frame. Such thermal expansion of saidelectrode is enabled by said flexure connection with said connecting lipand said slit defined by said connecting lip. The inner end of the slitmay be provided with a circular inner shape or as a hole having circularshape, the radius of which being larger than the distance between thelip and the electrode formed by the slit. In some embodiments, the slitfurther comprises a bend. Also this bend may comprise a circular innershape. The circular inner shapes may contribute to the thermal expansiontaking place in radial direction.

In an embodiment, when said power connecting assembly comprises anelectrically non-conductive connecting plate which is arranged at saidfirst frame part of said frame, wherein said power connecting assemblycomprises one or more connectors, said electrical wiring is peripherallyconnected to said electrode and is connected to said one or moreconnectors, and wherein the electrical wiring extends in a directionsubstantially parallel to said support members of said frame. Thus, theelectrical wiring is extending directly, in particular straight, fromthe periphery of the electrode to a respective connector. As theposition of the connectors at the non-conductive connecting plate, issubstantially determined by the periphery of the underlying electrode,the connectors can be placed remote from each other. An advantage ofthis embodiment is that the connectors can be provided at a safedistance from each other, such that mutual electrical contact betweensaid connectors is prevented.

In an embodiment the electrical wiring is flexible electrical wiring. Inthe context of the present patent application, the term ‘flexible’ hasto be understood as being capable of bending or being bent, but stillhaving a determined degree of rigidity. In the case that said force isapplied to the power connecting assembly and a part of said force istransferred into said flexible electrical wiring, said transferred forcecan be absorbed by the electrical wiring, at least partly, due to theflexibility thereof. Due to the flexible electrical wiring absorbing atleast a part of said force, it is prevented that said transferred forceacts on the individual components of said charged particle sourcearrangement. As a result thereof, the alignment and the relativepositions of the individual components of said charged particle sourcearrangement with respect to each other is maintained.

In an embodiment, when said first frame part is a first rigid framepart, said second frame part is a second rigid frame part, and said oneor more rigid support members are rigidly connected to said first framepart and said second frame part, said flexible electrical wiringcomprises one or more wires with a service loop.

According to a third aspect, the disclosed embodiments provide anexposure system for emitting a charged particle beam towards a surfaceor a target, comprising:

a charged particle source module for generating and emitting a chargedparticle beam according to the first aspect of the disclosed embodimentsor according to the second aspect of the disclosed embodiments; and

a charged particle optical arrangement configured to receive the chargedparticle beam generated and emitted by the charged particle sourcemodule, and to direct said charged particle beam towards said surface orsaid target,

wherein said second frame part of said frame is arranged at said chargedparticle optical arrangement.

Since said power connecting assembly is arranged at said first framepart and said second frame part is arranged at said charged particleoptical arrangement, a force applied to said power connecting assembly,for example during connecting an external power supply to said powerconnecting assembly, can be led into the first frame part. The force ledinto the first frame part can be transferred from said first frame partto said charged particle optical arrangement via the rigid supportmembers and said second frame part and can be absorbed by said chargedparticle optical arrangement. It is therewith prevented that said forceacts on said charged particle source arrangement and a strain relievingarrangement is hereby provided. Said frame with said power connectingassembly provides a force path between said power connecting assemblyand said second frame part, in particular between the power connectingassembly and said charged particle optical arrangement of said exposuretool.

In an embodiment said charged particle optical arrangement comprises acollimator, wherein said charged particle source module is arranged atsaid collimator.

During operation of the exposure tool, charged particles originatingfrom said charged particle source arrangement may deviate from agenerated charged particle beam and impinge onto a part of said chargedparticle source arrangement or said frame. The kinetic energy of suchdeviated charged particles is absorbed by said part of said chargedparticle source arrangement or said frame, which eventually leads to anincreased temperature thereof. By arranging said second frame part onwhich said charged particle source arrangement is arranged at saidcharged particle optical arrangement, thermal energy absorbed by thesecond frame part or the part of said charged particle sourcearrangement arranged at said second frame part can be conducted towardsand into said charged particle optical arrangement. It is therewithprevented that the temperature of said second frame part or said part ofsaid charged particle source arrangement increases or increasessignificantly. Optionally, the charged particle optical arrangement or apart thereof on which said charged particle source module is arrangedmay be actively cooled.

In an embodiment the exposure system is selected from a group comprisinga lithography system, an inspection system or a microscopy system.

According to a fourth aspect, the disclosed embodiments provide acharged particle source arrangement for generating a charged particlebeam, comprising:

an emitter arrangement configured for emitting charged particles;

an electrode for forming a charged particle beam from said chargedparticles emitted by said emitter arrangement; and

one or more electrically non-conductive supports oriented substantiallyparallel to an optical axis defined by said emitter arrangement and saidelectrode, wherein each of said one or more supports is connected withan outer circumference of said emitter arrangement and with an outercircumference of said electrode, and wherein said one or more supportsmaintain the orientation and/or the position of said emitter arrangementand said electrode with respect to each other,

wherein said electrode is connected with said one or more supports bymeans of a flexure connection,

wherein said electrode and/or or said emitter arrangement comprises oneor more electrical wire connections for connection of electrical wiring,

wherein at least one of said one or more electrical wire connections isarranged on said flexure connection.

Said supports are arranged to maintain said emitter arrangement and saidelectrode between said supports, in order to maintain the orientationand/or the position of said electrode and said emitter arrangement withrespect to each other. During operation, said emitter arrangementgenerates and emits charged particles, such as electrons, which areformed into a charged particle beam by said electrode. A part of saidcharged particle beam or charged particles from said emitter arrangementmay impinge onto said electrode, which leads to an increased temperatureof said electrode. An increased temperature of said electrode may leadto deformation, in particular expansion of said electrode. Since saidelectrode is positioned between said supports, in the absence of saidflexure connections, such deformation would lead to bending and/orwarping of said electrode, therewith changing the orientation and/orposition of said electrode with respect to said emitter arrangement. Achanged orientation and/or position distorts an electrical field formedbetween said emitter arrangement and said electrode. Said flexureconnections enable said electrode to deform substantially in a radialdirection with respect to the longitudinal center axis of said chargedparticle source arrangement, while preventing warping and/or bending ofsaid electrode in a direction parallel to the longitudinal direction ofsaid charged particle source arrangement.

Moreover, in practice, electric wires used for connecting the chargedparticle source arrangement to an external power supply, extend in adirection transverse to the main plane of for example said electrode. Ifsaid electric wires expand due to a temperature increase, the expandingforce (s) act(s) on the electrodes which can lead to disturbance of thealignment of the electrode with respect to said emitter arrangement. Byconnecting said electric wires to said flexure connection, the flexureconnection can absorb the expanding forces and lead these forces intosaid supports.

It is noted that said charged particle source arrangement may bearranged for generating an electron beam, wherein said emitterarrangement is adapted for emitting electrons from which an electronbeam is formed.

In an embodiment, said one or more electrical wire connections arelocated at a portion of said flexure connections where a position and/ororientation of said flexure connection with respect to said supports issubstantially fixed. In a further embodiment said at least one of saidone or more electrical wire connections is arranged on a distal end ofsaid connecting lip, which is the free end of the connecting lip, ofsaid at least one flexure connection. Arranging said electrical wireconnections close to/at said supports contributes to maintaining thealignment of said electrode. Furthermore, by arranging said electricalwire connections at said distal end, the risk of any expanding force,which is caused by expansion of said electric wires, acting on saidelectrode is further reduced or in the ideal case prevented.

In an embodiment said electrode comprises a plate-shaped electrode bodywith a beam aperture, which beam aperture is centered with respect tosaid optical axis. In a further embodiment, said flexure connectioncomprises a connecting lip provided at the outer circumference of saidplate-shaped electrode body, wherein said connecting lip defines a slitbetween said connecting lip and said plate-shaped electrode body. Ifsaid electrode is not provided with one or more flexure connections, dueto charged particles impinging onto said electrode, a temperatureincrease of said electrode can lead to thermal expansion of saidelectrode radially outwards with respect to the longitudinal center axisof said charged particle source arrangement. Such thermal expansion ofsaid electrode is enabled by said one or more flexure connections withsaid connecting lips and said slits defined by said connecting lips,while the supports remain in position and said electrode is preventedfrom warping and/or bending. Thereby the (intended) orientation and/orposition of said electrode and the charged particle optical functionthereof are maintained. The inner end of the slit may be provided with acircular inner shape or as a hole having circular shape, the radius ofwhich being larger than the distance between the lip and the electrodeformed by the slit. In some embodiments, the slit further comprises abend. Also this bend may comprise a circular inner shape. The circularinner shapes may contribute to the thermal expansion taking place inradial direction.

In an embodiment a plurality of said electrodes is provided. By theflexure connection provided at each electrode the mutual orientationand/or position can be maintained. Thereby, the charged particle opticalfunction, for example a lens function, is maintained.

In an embodiment said charged particle source arrangement comprises twoor more electrodes for forming a charged particle beam from said chargedparticles emitted by said emitter arrangement, wherein' at least one ofsaid two or more electrodes is rigidly connected to said one or moresupports, preferably a most downstream electrode of said two or moreelectrodes is rigidly connected to said one or more supports. During useof said charged particle source arrangement, said most downstreamelectrode is most likely arranged on a charged particle opticalarrangement of an exposure system. Due to said arrangement, thermalenergy absorbed by said most downstream electrode is conducted towardsand into said charged particle optical arrangement, therewith minimizingor preventing any temperature increase of said most downstreamelectrode.

In an embodiment said emitter arrangement comprises a cathode foremitting said charged particles, wherein said cathode is received withina cathode carrying element which is connected to said one or moresupports by means of a flexure connection. In a further embodiment saidcathode carrying element comprises a plate-shaped carrying body with acathode aperture for receiving at least a part of said cathode,preferably wherein said flexure connection comprises a connecting lipprovided at the outer circumference of said plate-shaped carrying body,wherein said connecting lip defines a slit between said connecting lipand said plate-shaped carrying body. During operation of said chargedparticle source arrangement, the temperature of said charged particlesource arrangement and/or said cathode carrying element may increase,which may lead to deformation, in particular expansion of saidplate-shaped carrying element in a radial direction. Said flexureconnections prevent said cathode carrying element from bending and/orwarping in the longitudinal direction of said charged particle sourcearrangement as explained above in relation to said electrode.

In an embodiment said charged particle source arrangement comprises aframe including a first frame part, a second frame part, and one or morerigid support members which are arranged between said first frame partand said second frame part, and a power connecting assembly arranged atsaid first frame part, wherein said charged particle source arrangementis arranged at said second frame part and is electrically connected tosaid connecting assembly via electrical wiring. During connection of anexternal power supply to said power connecting assembly, a force isexerted onto said power connecting assembly. Due to the arrangement ofsaid power connecting assembly on said first frame part, this force islead into said first frame part. The force led into the first frame partcan be transferred from said first frame part to said second frame partvia the rigid support members, therewith preventing that said force actson said charged particle source arrangement and providing a strainrelieving arrangement.

According to a fifth aspect, the disclosed embodiments provide a chargedparticle source module according to the first or second aspect of thedisclosed embodiments, wherein the charged particle source arrangementis a charged particle source arrangement according to the fourth aspectof the disclosed embodiments.

According to a sixth aspect, the disclosed embodiments provide a methodof manufacturing a semiconductor device by means of a charged particlesource module according to the first or second aspect of the disclosedembodiments, or by means of a charged particle source arrangementaccording to the fourth aspect of the disclosed embodiments, the methodcomprising the steps of:

placing a wafer downstream of said charged particle source module orsaid charged particle source arrangement;

processing said wafer including projecting an image or a pattern on saidwafer by means of a charged particle beam generated and emitted by thecharged particle source module or said charged particle sourcearrangement; and

performing subsequent steps in order to generate a semiconductor deviceby means of said processed wafer

The subsequent steps of manufacturing a semiconductor device from saidprocessed wafer are known in the technical field of manufacturingsemiconductor devices. A number of said subsequent steps are for exampledescribed in the United States patent application No. US 2014/0176920 A1of the Applicant.

According to a seventh aspect, the disclosed embodiments provide amethod for inspecting a target by means of a charged particle sourcemodule according to the first or second aspect of the disclosedembodiments, or by means of a charged particle source arrangementaccording to the fourth aspect of the disclosed embodiments, the methodcomprising the steps of:

positioning said target downstream of said charged particle sourcemodule or said charged particle source arrangement;

directing a charged particle beam generated and emitted by said chargedparticle source module or said charged particle source arrangementtowards said target;

detecting charged particles transmitted, emitted and/or reflected bysaid target in response to the charged particle beam directed towardssaid target; and

performing subsequent steps in order to inspect said target by means ofdata from the step of detecting charged particles.

The various aspects and features described and shown in thespecification can be applied, individually, wherever possible. Theseindividual aspects, in particular the aspects and features described inthe attached dependent claims, can be made subject of divisional patentapplications.

BRIEF DESCRIPTION OF THE DRAWINGS

The disclosed embodiments will be elucidated on the basis of exemplaryembodiments as shown in the attached drawings, in which:

FIG. 1 schematically shows an example of an exposure apparatus with acharged particle source module;

FIG. 2A shows an isometric view of a charged particle source arrangementhaving an emitter arrangement, and electrodes;

FIG. 2B shows an isometric view of an electrode;

FIG. 3A shows an isometric view of an charged particle source module;and

FIG. 3B shows a cross-section of said charged particle source module ofFIG. 3A along line TIM.

DETAILED DESCRIPTION OF THE DRAWINGS

FIG. 1 schematically shows an example of an exposure system 100 with acharged particle source module 102. The exposure apparatus 100 comprisesa housing 101 in which a charged particle source module 102 is placedwith a first rigid frame part 103, a second rigid frame part 104 andrigid bars 105 arranged between and rigidly connected to the first framepart 103 and the second frame part 104. The charged particle module 102comprises a power connecting assembly on the first frame part 103, and acharged particle source arrangement 106 arranged at the second framepart 104 and electrically connected to the power connecting assembly viaflexible electrical wires 107. The charged particle source arrangementmodule 102 is arranged at a charged particle optical arrangement 108,such as a magnetic or an electrostatic collimator. The charged particleoptical arrangement 108 is adapted to direct a charged particle beamreceived from the charged particle source module towards a target 109along an optical axis OA. The charged particle source module 102, thecharged particle optical arrangement 108 and the target 109 are placedwithin a vacuum part 110 of the exposure system 100. The exposure system100 can be one of a lithography system, an inspection system or amicroscopy system. The exposure system 100 is schematically shown inFIG. 1 and the construction details of each of the known mentionedsystems are known within the relevant technical field.

For example when said exposure system 100 is a lithography system, saidlithography system may further comprise inter alia a collimator forcollimating said charged particle beam from the charged particle sourcemodule 102, an aperture array for generating individual beamlets, and adeflector array (beam blanker array) with multiple deflectors eacharranged for deflecting an individual beamlet. Further, said exposuresystem 100 may comprise a beam stop array with an array of apertures,one aperture for each individual beamlet and a lens array with an arrayof lenses for focusing the charged particle beamlets onto the target109. The arrangement of the parts of said lithography system is knownwithin the relevant technical field. An example of a lithography systemis for example shown in international patent application WO 2009/127659A2 of the Applicant.

For example when said exposure system 100 is an electron microscopysystem, the microscopy system may further comprise an optical systemarranged to direct a electron beam from said charged particle sourcemodule 102 towards several electron lenses which are arranged to focusthe electron beam onto the surface of the target 109. Said exposuresystem 100 may be provided with one or more deflectors for scanning theelectron beam over the surface of the target 109. Said exposure system100 may be provided with sensors which can detect the scatteredelectrons, secondary electrons and/or generated light from said target109.

FIG. 2A shows an example of a charged particle source arrangement 1,which can correspond to the charged particle source arrangement 106 ofFIG. 1 . The charged particle source arrangement 1 comprises an emitterarrangement 2 which is provided for emitting charged particles in anemitting direction towards a surface or a target, such as a wafer. Thecharged particle source arrangement 1 comprises multiple electrodes10-14 downstream of said emitter arrangement 2, also known as shapingelectrodes, which electrodes 11-14 are configured for extracting saidcharged particles emitted by said emitter arrangement 2 and to form thecharged particles into a beam of charged particles. The emitterarrangement 2 and the electrodes 11-14 are connected to and retainedbetween supports, for example glass rods 4 which are configured formaintaining the emitter arrangement 2 and the electrodes 11-14 in adesired position and orientation with respect to each other. Each of thesupports is connected to each of the emitter arrangement 2 and theelectrodes 11-14. The emitter arrangement 2 and the electrodes 11-14 canbe connected to a non-shown external power supply via electric wires 5with service loops 6. These service loops can be provided as U-bends,extending substantially perpendicular to the extension of the electricalwire, as illustrated in FIG. 2A. In FIG. 2A, not all electrical wiresare shown. It is however understood that to each electrode at least oneelectrical wire is connected.

Alternatively, the service loops can be provided as full loops, formedby the electrical wire making a full 360° turn. It is noted that theservice loops shaped as U-bends require less energy to deform incomparison with service loops shaped as full loops.

As illustrated in FIG. 2A the emitter arrangement 2 comprises an emitterbody 15. A first filament connection 16 and a second filament connection17 are connected to the emitter body 15, wherein both of the first andsecond filament connections 16 and 17 are connected to electrical wires5 in order to connect the emitter arrangement 2 to an external powersupply. As illustrated in FIG. 2A the emitter arrangement 2 comprises acarrying element 18 attached to a plate-shaped carrying body 10including an emitter aperture allowing passage to at least a chargedparticle beam, such as an electron beam, emitted from the emitterarrangement 2. The plate-shaped carrying body 10 is provided with anelectrical wire 21 for connecting the plate-shaped carrying body 19 to anon-shown external power supply. Hence, the plate-shaped carrying body10 may also be considered an electrode.

The emitter arrangement 2 may comprise a single cathode for emitting acharged particle beam, for example a thermionic cathode heated by afilament, or tandem arrangement of a thermionic cathode heated byanother cathode. For a detailed description of the construction andworking of the emitter arrangement 2 with a tandem arrangement,reference is made to the international patent application WO 2015/101538A1 of the Applicant, which is fully incorporated herein by reference. Itis noted that other kinds of emitter arrangements are possible.

As shown in FIGS. 2A and 2B, each of the electrodes 11-14 and theplate-shaped carrying body 10 comprises a plate-shaped electrode body60, whereby each of the plate-shaped electrode body 60 comprises a beamaperture 61 which allows passage to a charged particle beam B. Thediameter of each of the subsequent beam apertures 61 of each of theelectrodes 11-14 increases with each subsequently beam aperture 61 inthe downstream direction parallel to the longitudinal direction L, alsoreferred to as optical axis, of the charged particle source arrangement1. It is therefore possible to generate and emit a diverging chargedparticle beam by the charged particle source arrangement 1.

The electrodes 11-13 placed upstream of the most downstream electrode 14and downstream of the emitter arrangement 2 comprises one or twoelectrical connecting elements 62 for electrically connecting each ofthe electrodes 11-13 to a non-shown external power supply. FIG. 2B onlyshows one electrode 11, and the remaining electrodes 12-13 differ fromthe shown electrode 10 in the location of the electrical connectingelements 62. The one or two connecting elements 62 of each electrode11-13 are configured in such way that two electrical wires are connectedto each of the electrodes 11-13.

As illustrated in FIG. 2B, flexure connections 65 are provided at thecircumference of the electrode body 60, which flexure connections 65 areprovided for connecting the electrodes 11-13 and the carrying body 10 tothe glass rods 4. Each of the flexure connections 65 comprises aconnecting lip 66 provided at the outer circumference of the electrodebody 60, somewhat radially projecting thereof and extending in thecircumferential direction thereof. The connecting lips 66 are equallydistributed over the outer circumference of the electrode body 60. Eachof the connecting lips 66 has a first lip part 67 and a second lip part68, wherein the first lip part 67 is connected to the electrode body 60at one end and to the second lip part 68 at the other end. Each of theconnecting lips 66 defines a slit 69 between the connecting lip 66 andthe outer circumference of the electrode body 60. As can be seen in FIG.2B, the inner end 69 a of the slit 69 has a circular inner shape. Incase the slit 69 comprises a bend 69b, as in the illustrated embodiment,also this bend comprises a circular inner shape. The circular innershapes may contribute to absorbing the thermal expansion taking place inradial direction. The second lip part 68 of each connecting lip 66comprises connecting elements 70 which are taken up in one of the glassrods 4 to rigidly connect the flexure connections 65 to the glass rods4, thereby enabling the electrodes 11-13 and the carrying body 10 to.expand radially due to an increase of temperature while the thermalexpansion is absorbed by the slits 69. In the shown embodiment, the mostdownstream electrode 14 is free of such flexure connections 65. As shownin FIG. 2A the electrical connecting elements 62 can be provided at oneof the flexure connections 65 of one or more of the electrodes 11-13.

The most downstream electrode 14 further comprises non-shown connectingelements similar to the connecting elements 70 of the electrodes 11-13.The connecting elements extend radially outwards from the electrode body60 of the most downstream electrode 14 for rigidly connecting the mostdownstream electrode 14 to the glass rods 4. As shown in FIG. 2A, theelectrode body 60 of the most downstream electrode 14 comprises radiallyoutwardly extending plate-shaped connecting projections 63 with anopening 64 provided therein. The plate-shaped connecting projections 63may be used for connecting and/or aligning the charged particle sourcearrangement 1 to a non-shown exposure system or a charged particleoptical arrangement thereof by means of a form closure.

As shown in FIG. 2A the glass rods 4 extend in a direction parallel tothe longitudinal direction beyond the most downstream electrode 14, sothat the lower ends of the glass rods 4 can contribute to aligning thecharged particle source arrangement 1 with respect to an exposure systemor a charged particle optical arrangement thereof on which the chargedparticle source arrangement 1 may be arranged.

FIG. 3A shows an example of a charged particle source module 200, whichcan correspond to the charged particle source module 102 of FIG. 1 . Thecharged particle source module 200 comprises a frame with a first framepart 201, a second frame part 202 and rigid support members in the formof rigid bars 203, which are arranged between the first frame part 201and the second frame part 202. Different parts of said frame may be madeof non-magnetic material or non-ferrous material, such as a materialcomprising titanium. The charged particle source module 200 furthercomprises a charged particle source arrangement 204 with electricalwires 206, which is arranged at the second frame part 202. Fordescribing the charged particle source module 200, it is provided thatthe charged particle source arrangement 204 corresponds to the chargedparticle source arrangement 1 as described above. The charged particlesource module 200 further comprises a power connecting assembly 207,wherein the charged particle source arrangement 204 is electricallyconnected to the power connecting assembly 207 via the electrical wires206.

As illustrated in FIGS. 3A and 3B the power connecting assembly 207comprises a non-conductive circular support plate 208 which is arrangedat the first frame part 201. The support plate 208 may be manufacturedfrom for example Macor®, a machinable glass-ceramic. The support plate208 has securing recesses 209 which are provided in the upper and lowersurface of the support plate 208 and are intended for arranging thesupport plate 208 on the first frame part 201. The securing recesses 209are provided at the outer circumference of the support plate 208 and areuniformly distributed in the circumferential direction thereof. Thepower connecting assembly 207 further comprises electrical connectors210 for electrically connecting the electrical wires 206 to a non-shownexternal power supply, which electrical connectors 210 extend throughthe support plate 208 in a direction substantially parallel to the rigidbars 203. As best shown in FIG. 3B the electrical connectors 210 arereceived within connector openings 211 of the support plate 208, wherebya seal, in particular a glass seal 212 is provided between the inneredge of each of the connectors openings 211 and the electrical connector210 received within the respective connector opening 211.

As schematically shown in FIG. 3B when a force FI is exerted onto one ormore of the electrical connectors 210 of the power connecting assembly207, thereby exerting a force onto plane V, a force F2 is appliedthrough the first frame part 201 onto the rigid bars 203. Said force FI,F2 is led towards and into the rigid bars 203, as is indicatedschematically by force path F3. Via the rigid bars 203, the force is ledtowards and into the second frame part 202 via which the force may betransferred to for example an exposure system or a charged particleoptical arrangement thereof on which the charged particle source module200 may be arranged. Thereby a strain relieving arrangement is achieved.

The first frame part 201 comprises two substantially parallel annularplates 220, 221, for example made of a non-ferrous material such as amaterial comprising titanium, as shown in FIG. 3A and 3B. At the innercircumference, each of the annular plates 220, 221 has radially inwardsextending securing projections 223 which are uniformly distributed overthe inner circumference of the annular plates 220, 221. The securingprojections 223 are provided for clamping the support plate 208 therebetween. In the clamped configuration, the securing projections 223 ofthe lower annular plate 220 are received within the securing recesses209 at the lower surface of the support plate 208 and the securingprojections 223 of the upper annular plate 220 are received within thesecuring recesses 209 at the upper surface of the support plate 208.

The annular plates 220, 221 comprises attachment apertures which areadapted for receiving attachment screws or bolts 227 and/orrejuvenations provided at the upper end of the rigid bars 203, such thatthe annular plates 220, 221 become connected to each other. Asillustrated in FIG. 3B spacers 229 are provided between the upper andlower annular plates 220, 221, which spacers 229 are adapted forreceiving the attachment screws or bolts 227 and/or rejuvenationsprovided at the upper end of the rigid bars 203. The thickness of thespacers 229 is slightly smaller than the thickness of the support plate208.

As illustrated in FIG. 3A the second frame part 202 comprises an annularmounting plate 240, which is for example made of non-ferrous materialsuch as a material comprising titanium. At the inner circumference, theannular mounting plate 240 comprises plate-shaped connecting projections242 with are extending radially inwards. The plate-shaped connectingprojections 242 are provided with apertures 243 which may be configuredfor receiving for example a pin or another securing means. Asillustrated in FIG. 3B, the upper sides of the plate-shaped connectingprojections 63 of the electrode 14 are connected to the lower sides ofthe plate-shaped connecting projections 242 of the second frame part202, thereby arranging the electrode 14 between the second frame part202 and an exposure tool or a charged particle optical arrangementthereof. The longitudinal axis of the charged particle sourcearrangement 204 preferably coincides with, the longitudinal axis of theframe. Thereby, positioning of said charged particle source arrangement204 in a plane substantially perpendicular to the longitudinal axisthereof is performed upon arranging the charged particle source module200 to an exposure system or a charged particle optical arrangementthereof.

It is noted that in another embodiment, said most downstream electrode14 and said annular mounting plate 240 may be formed as a single part.

The annular mounting plate 240 comprises mounting members includingsecuring apertures 245 which are configured for receiving securingscrews or bolts 246 for securing the charged particle source module 200to an exposure system or a charged particle optical system thereof. Eachof the securing apertures 245 is arranged within a connecting lip 244 ofa flexure connection. Each of the connecting lips 244 is provided nearthe outer circumference of the annular mounting plate 240 and extends inthe circumferential direction thereof. The connecting lips 244 areequally distributed over the outer circumference of the annular mountingplate 240. Each of the connecting lips 244 defines a slit 247 betweenthe connecting lip 244 and the remaining of the annular mounting plate240. Thereby, tilting of the charged particle source module 200 isprevented upon arranging the charged particle source module 200 to anexposure system or a charged particle optical arrangement thereof.

It is noted that the attachment apertures 224 in the first frame part201 are provided in line with the securing apertures 245 and thesecuring bolts or screws 246 received therein, such that the securingbolts or screws 246 are accessibly by a tool via the attachmentapertures 224.

It is noted that the rigid bars 203 are rigidly connected to the secondframe part 202, in particular the annular mounting plate 240 thereof,for example by means of welding.

The embodiments may further be described using the following clauses:

1. Charged particle source module for generating and emitting a chargedparticle beam, comprising:

a frame including a first rigid frame part, a second rigid frame part,and one or more rigid support members which are arranged between andrigidly connected to said first frame part and said second frame part;

a charged particle source arrangement for generating a charged particlebeam, wherein said charged particle source arrangement is arranged atsaid second frame part; and

a power connecting assembly arranged at said first frame part,

wherein said charged particle source arrangement is electricallyconnected to said power connecting assembly via electrical wiring.

2. Charged particle source module for generating and emitting a chargedparticle beam, comprising:

a frame including a first frame part, a second frame part, and one ormore rigid support members which are arranged between said first framepart and said second frame part;

a charged particle source arrangement for generating a charged particlebeam, wherein said charged particle source arrangement is arranged atsaid second frame part; and

a power connecting assembly arranged at said first frame part,

wherein said charged particle source arrangement is electricallyconnected to said power connecting assembly via electrical wiring,wherein said electrical wiring comprises one or more wires with aservice loop.

3. Charged particle source module according to clause 1 or clause 2,wherein said frame comprises mounting members which are connected tosaid second frame part by flexure connections, preferably wherein saidsecond frame part comprises a mounting plate and each of said flexureconnections comprises a connecting lip provided at the outercircumference of said mounting plate, wherein each connecting lipdefines a slit between said mounting plate and said connecting lip.

4. Charged particle source module according to any one of the precedingclauses, wherein said first frame part, said second frame part and/orsaid one or more rigid support members are made of a non-ferrousmaterial.

5. Charged particle source module according to any one of the precedingclauses, wherein said power connecting assembly is rigidly connected tosaid first frame part, and said charged particle source arrangement isrigidly connected to said second frame part.

6. Charged particle source module according to any one of the precedingclauses, wherein said power connecting assembly comprises anelectrically non-conductive connecting plate which is arranged at saidfirst frame part of said frame, wherein said power connecting assemblycomprises one or more connectors.

7. Charged particle source module according to clause 6, wherein saidone or more connectors extend through said electrically non-conductiveconnecting plate in a direction substantially parallel to said supportmembers of said frame.

8. Charged particle source module according to clause 6 or clause 7,wherein said first frame part comprises two substantially parallelplates, wherein the power connecting assembly is secured, preferablyclamped between said two plates.

9. Charged particle source module according to any one of the precedingclauses, wherein said charged particle source arrangement comprises anemitter arrangement configured for emitting charged particles, and anelectrode for forming a charged particle beam from said chargedparticles emitted by said emitter arrangement, preferably wherein saidcharged particle source arrangement comprises two or more electrodes forforming a charged particle beam from said charged particles emitted bysaid emitter arrangement, wherein a most downstream electrode of saidtwo or more electrodes is preferably arranged at said second frame partof said frame, wherein said most downstream electrode and said secondframe part are preferably formed as a single part.

10. Charged particle source module according to clause 9, wherein saidemitter arrangement and said electrode are connected to one or moreelectrically non-conductive supports oriented substantially parallel toan optical axis defined by said emitter arrangement and said electrode,wherein each of said one or more supports is connected with an outercircumference of said emitter arrangement and with an outercircumference of said electrode, and wherein said one or more supportsmaintain the orientation and/or the position of said emitter arrangementand said electrode with respect to each other, preferably wherein atleast one . of said emitter arrangement and said electrode is connectedwith said one or more supports by means of a flexure connection.

11. Charged particle source module according to clause 10, wherein atleast one of said emitter arrangement and said electrode is rigidlyconnected to said one or more supports, preferably wherein said mostdownstream electrode is rigidly connected to said one or more supports.

12. Charged particle source module according to clause 10 or clause 11,wherein said emitter arrangement and said electrode comprise aplate-shaped electrode body, wherein said flexure connection comprises aconnecting lip provided at the outer circumference of said plate-shapedelectrode body, wherein said connecting lip defines a slit between saidconnecting lip and said plate-shaped electrode body.

13. Charged particle source module according to any one of the clauses9-13,

when dependent on clause 6, wherein said electrical wiring isperipherally connected to said electrode and is connected to said one ormore connectors, and wherein the electrical wiring extends in adirection substantially parallel to said support members of said frame.

14. Charged particle source module according to any one of the precedingclauses, wherein the electrical wiring is flexible electrical wiring.

15. Charged particle source module according to any one of the precedingclauses, when dependent on clause 1, wherein said electrical wiringcomprises one or more wires with a service loop.

16. Exposure system for emitting a charged particle beam towards asurface or a target, comprising:

a charged particle source module for generating and emitting a chargedparticle beam according to any one of the preceding clauses; and

a charged particle optical arrangement configured to receive the chargedparticle beam generated and emitted by the charged particle sourcemodule, and to direct said charged particle beam towards said surface orsaid target,

wherein said second frame part of said frame is arranged at said chargedparticle optical arrangement.

17. Exposure system according to clause 16, wherein said chargedparticle optical arrangement comprises a collimator, wherein saidcharged particle source module is arranged at said collimator.

18. Exposure system according to clause 16 or clause 17, wherein theexposure system is selected from a group comprising a lithographysystem, an inspection system or a microscopy system.

19. Charged particle source arrangement for generating a chargedparticle beam, comprising:

an emitter arrangement configured for emitting charged particles;

an electrode for forming a charged particle beam from said chargedparticles emitted by said emitter arrangement; and

one or more electrically non-conductive supports oriented substantiallyparallel to an optical axis defined by said emitter arrangement and saidelectrode, wherein each of said one or more supports is connected withan outer circumference of said emitter arrangement and with an outercircumference of said electrode, and wherein said one or more supportsmaintain the orientation and/or the position of said emitter arrangementand said electrode with respect to each other,

wherein said electrode is connected with said one or more supports bymeans of a flexure connection,

wherein said electrode and/or said emitter arrangement comprises one ormore electrical wire connections for connection of electrical wiring,wherein at least one of said one or more electrical wire connections isarranged on said flexure connection.

20. Charged particle source arrangement according to 19, wherein saidone or more electrical wire connections are located at a portion of saidflexure connections where a position and/or orientation of said flexureconnection with respect to said supports is substantially fixed.

21. Charged particle source arrangement according to clause 19 or clause20, wherein said at least one of said one or more electrical wireconnections is arranged on a distal end of said connecting lip of saidflexure connection.

22. Charged particle source arrangement according to any one of theclauses 19-21, wherein said electrode comprises a plate-shaped electrodebody with a beam aperture, which beam aperture is centered with respectto said optical axis.

23. Charged particle source arrangement according to clause 22, whereinsaid flexure connection comprises a connecting lip provided at the outercircumference of said plate-shaped electrode body, wherein saidconnecting lip defines a slit between said connecting lip and saidplate-shaped electrode body.

24. Charged particle source arrangement according to any one of thepreceding clauses 19-23, wherein said charged particle sourcearrangement comprises two or more electrodes for forming a chargedparticle beam from said charged particles emitted by said emitterarrangement, wherein at least one of said two or more electrodes isrigidly connected to said one or more supports, preferably wherein amost downstream electrode of said two or more electrodes is rigidlyconnected to said one or more supports.

25. Charged particle source arrangement according to any one of clauses19-24, wherein said emitter arrangement comprises a cathode for emittingsaid charged particles, wherein said cathode is received within acathode carrying element which is connected to said one or more supportsby means of a flexure connection.

26. Charged particle source arrangement according to clause 25, whereinsaid cathode carrying element comprises a plate-shaped carrying bodywith a cathode aperture for receiving at least a part of said cathode,preferably wherein said flexure connection comprises a connecting lipprovided at the outer circumference of said plate-shaped carrying body,wherein said connecting lip defines a slit between said connecting lipand said plate-shaped carrying body.

27. Charged particle source arrangement according to any one of thepreceding clauses 19-26, further comprising a frame including a firstframe part, a second frame part, and one or more rigid support memberswhich are arranged between said first frame part and said second framepart, and a power connecting assembly arranged on said first frame part,wherein said charged particle source arrangement is arranged on saidsecond frame part and is electrically connected to said power connectingassembly via electrical wiring.

28. Charged particle source module according to any one of the clauses1-15, wherein the charged particle source arrangement is a chargedparticle source arrangement according to any one of the clauses 19-27.

29. Method of manufacturing a semiconductor device by means of a chargedparticle source module according to any one of the clauses 1-15, or acharged particle source arrangement according to any one of the clauses19-27, the method comprising the steps of:

placing a wafer downstream of said charged particle source module orsaid charged particle source arrangement;

processing said wafer including projecting an image or a pattern on saidwafer by means of a charged particle beam generated and emitted by saidcharged particle source module or said charged particle sourcearrangement; and

performing subsequent steps in order to generate a semiconductor deviceby means of said processed wafer.

30. Method for inspecting a target by means of a charged particle sourcemodule according to any one of the clauses 1-15, or a charged particlesource arrangement according to any one of the clauses 19-27, the methodcomprising the steps of:

positioning said target downstream of said charged particle sourcemodule or said charged particle source arrangement;

directing a charged particle beam generated and emitted by said chargedparticle source module or said charged particle source arrangementtowards said target;

detecting charged particles transmitted, emitted and/or reflected bysaid target in response to the charged particle beam directed towardssaid target; and

performing subsequent steps in order to inspect said target by means ofdata from the step of detecting charged particles.

It is to be understood that the above description is included toillustrate the operation of the preferred embodiments and is not meantto limit the scope of the disclosed embodiments of the invention. Fromthe above discussion, many variations will be apparent to one skilled inthe art that would yet be encompassed by the scope of the presentinvention.

1. (canceled)
 2. A charged particle source module for generating andemitting a charged particle beam, comprising: a frame including a firstframe part, a second frame part, and one or more support members whichare arranged between said first frame part and said second frame part; acharged particle source arrangement for generating a charged particlebeam; and a power connecting assembly arranged at said first frame part,wherein said charged particle source arrangement is electricallyconnected to said power connecting assembly via electrical wiring,wherein said electrical wiring comprises one or more wires with aservice loop.
 3. The charged particle source module of claim 2, wherein:said frame comprises mounting members which are connected to said secondframe part by flexure connections; wherein said second frame partcomprises a mounting plate, each of said flexure connections comprises aconnecting lip provided at the outer circumference of said mountingplate; and wherein each connecting lip defines a slit between saidmounting plate and said connecting lip.
 4. The charged particle sourcemodule of claim 2, wherein said first frame part, said second frame partand/or said one or more rigid support members are made of a non-ferrousmaterial.
 5. The charged particle source module of claim 2, wherein saidpower connecting assembly is rigidly connected to said first frame part,and said charged particle source arrangement is rigidly connected tosaid second frame part.
 6. The charged particle source module of claim2, wherein said power connecting assembly comprises an electricallynon-conductive connecting plate which is arranged at said first framepart of said frame, wherein said power connecting assembly comprises oneor more connectors.
 7. The charged particle source module according toclaim 6, wherein said one or more connectors extend through saidelectrically non-conductive connecting plate in a directionsubstantially parallel to said support members of said frame.
 8. Thecharged particle source module according to claim 6, wherein said firstframe part comprises two substantially parallel plates, wherein thepower connecting assembly is secured between said two plates.
 9. Thecharged particle source module of claim 2, wherein said charged particlesource arrangement comprises an emitter arrangement configured foremitting charged particles, and an electrode for forming a chargedparticle beam from said charged particles emitted by said emitterarrangement.
 10. The charged particle source module of claim 9, whereinsaid emitter arrangement and said electrode are connected to one or moreelectrically non-conductive supports oriented substantially parallel toan optical axis defined by said emitter arrangement and said electrode,wherein each of said one or more supports is connected with an outercircumference of said emitter arrangement and with an outercircumference of said electrode, and wherein said one or more supportsmaintain the orientation and/or the position of said emitter arrangementand said electrode with respect to each other.
 11. The charged particlesource module of claim 10, wherein at least one of said emitterarrangement and said electrode is rigidly connected to said one or moresupports.
 12. The charged particle source module of claim 10, whereinsaid emitter arrangement and said electrode comprise a plate-shapedelectrode body, wherein said flexure connection comprises a connectinglip provided at the outer circumference of said plate-shaped electrodebody, wherein said connecting lip defines a slit between said connectinglip and said plate-shaped electrode body.
 13. The charged particlesource module of claim 9, said power connecting assembly comprising anelectrically non-conductive connecting plate that is arranged at saidfirst frame part of said frame, wherein said power connecting assemblycomprises one or more connectors, wherein said electrical wiring isperipherally connected to said electrode and is connected to said one ormore connectors, and wherein the electrical wiring extends in adirection substantially parallel to said support members of said frame.14. The charged particle source module of claim 2, wherein theelectrical wiring is flexible electrical wiring.
 15. The chargedparticle source module of claim 2, wherein said service loop is betweenthe first frame part and the second frame part.
 16. An exposure systemfor emitting a charged particle beam towards a surface or a target,comprising: a charged particle source module for generating and emittinga charged particle beam of claim 1; and a charged particle opticalarrangement configured to receive the charged particle beam generatedand emitted by the charged particle source module, and to direct saidcharged particle beam towards said surface or said target, wherein saidsecond frame part of said frame is arranged at said charged particleoptical arrangement.
 17. The exposure system of claim 16, wherein saidservice loop comprises a bend along a portion of the electrical wiring,the bend extending in a direction that is not parallel to the directionof the electrical wiring. 18.-30. (canceled)
 31. A charged particlesource for generating and emitting a charged particle beam, comprising:a frame including a first frame part, a second frame part, and one ormore support members which are arranged between said first frame partand said second frame part; a charged particle source arrangement forgenerating a charged particle beam; and a power connecting assemblyarranged at said first frame part, wherein said charged particle sourcearrangement is electrically connected to said power connecting assemblyvia electrical wiring, wherein said electrical wiring comprises a bendalong a portion of the electrical wiring, the bend extending in adirection that is not parallel to the direction of the electricalwiring.
 32. The charged particle source arrangement of claim 31, whereinthe bend is substantially u-shaped.
 33. The charged particle sourcearrangement of claim 31, wherein the bend is between the first framepart and the second frame part.
 34. The charged particle sourcearrangement of claim 31, wherein the bend comprises a service loop.